| A survey of industrial model predictive control technology SJ Qin, TA Badgwell Control engineering practice 11 (7), 733-764, 2003 | 6617 | 2003 |
| An overview of industrial model predictive control technology SJ Qin, TA Badgwell AIche symposium series 93 (316), 232-256, 1997 | 1525 | 1997 |
| An overview of nonlinear model predictive control applications SJ Qin, TA Badgwell Nonlinear model predictive control, 369-392, 2000 | 831 | 2000 |
| Nonlinear predictive control and moving horizon estimation—an introductory overview F Allgöwer, TA Badgwell, JS Qin, JB Rawlings, SJ Wright Advances in control, 391-449, 1999 | 751 | 1999 |
| Disturbance modeling for offset-free linear model predictive control KR Muske, TA Badgwell Journal of Process Control 12 (5), 617-632, 2002 | 588 | 2002 |
| Reinforcement learning–overview of recent progress and implications for process control J Shin, TA Badgwell, KH Liu, JH Lee Computers & Chemical Engineering 127, 282-294, 2019 | 263 | 2019 |
| Robust model predictive control of stable linear systems TA Badgwell International journal of control 68 (4), 797-818, 1997 | 198 | 1997 |
| Robust steady‐state target calculation for model predictive control DE Kassmann, TA Badgwell, RB Hawkins AIChE Journal 46 (5), 1007-1024, 2000 | 195 | 2000 |
| Modeling and control of microelectronics materials processing TA Badgwell, T Breedijk, SG Bushman, SW Butler, S Chatterjee, TF Edgar, ... Computers & chemical engineering 19 (1), 1-41, 1995 | 81 | 1995 |
| Fusion of machine learning and MPC under uncertainty: What advances are on the horizon? A Mesbah, KP Wabersich, AP Schoellig, MN Zeilinger, S Lucia, ... 2022 American Control Conference (ACC), 342-357, 2022 | 63 | 2022 |
| Reinforcement learning–overview of recent progress and implications for process control TA Badgwell, JH Lee, KH Liu Computer Aided Chemical Engineering 44, 71-85, 2018 | 60 | 2018 |
| Model predictive control in practice TA Badgwell, SJ Qin Encyclopedia of Systems and Control, 1239-1252, 2021 | 49 | 2021 |
| Modeling the wafer temperature profile in a multiwafer LPCVD furnace TA Badgwell, I Trachtenberg, TF Edgar Journal of the Electrochemical Society 141 (1), 161, 1994 | 47 | 1994 |
| Robust steady-state target calculation for model predictive control DE Kassmann US Patent 6,714,899, 2004 | 44 | 2004 |
| Robust stability conditions for SISO model predictive control algorithms TA Badgwell Automatica 33 (7), 1357-1361, 1997 | 42 | 1997 |
| Disturbance model design for linear model predictive control TA Badgwell, KR Muske Proceedings of the 2002 American Control Conference (IEEE Cat. No. CH37301 …, 2002 | 41 | 2002 |
| Experimental Verification of a Fundamental Model for Multiwafer Low‐pressure Chemical Vapor Deposition of Polysilicon TA Badgwell, TF Edgar, I Trachtenberg, JK Elliott Journal of the Electrochemical Society 139 (2), 524, 1992 | 39 | 1992 |
| Robust steady-state target calculation for model predictive control DE Kassmann, TA Badgwell, RB Hawkins US Patent 6,381,505, 2002 | 30 | 2002 |
| In situ measurement of wafer temperatures in a low pressure chemical vapor deposition furnace TA Badgwell, TF Edgar, I Trachtenberg, G Yetter, JK Elliott, RL Anderson IEEE transactions on semiconductor manufacturing 6 (1), 65-71, 1993 | 29 | 1993 |
| Modeling and scale‐up of multiwafer LPCVD reactors TA Badgwell, TF Edgar, I Trachtenberg AIChE journal 38 (6), 926-938, 1992 | 29 | 1992 |
S. Joe QinLingnan University, Hong Kong, President, Member of EASA, Fellow of HKAES, NAI, IEEE, IFAC, AIChEVerified email at ln.edu.hk
